Atomic layer etching of 3D structures in silicon:...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2017 / 05 Vol. 35; Iss. 3

Atomic layer etching of 3D structures in silicon: Self-limiting and nonideal reactions

Huard, Chad M., Zhang, Yiting, Sriraman, Saravanapriyan, Paterson, Alex, Kanarik, Keren J., Kushner, Mark J.
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4979661
Date:
May, 2017
File:
PDF, 6.39 MB
english, 2017
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