Prediction of plasma-induced damage distribution during...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2015 / 11 Vol. 33; Iss. 6

Prediction of plasma-induced damage distribution during silicon nitride etching using advanced three-dimensional voxel model

Kuboi, Nobuyuki, Tatsumi, Tetsuya, Kinoshita, Takashi, Shigetoshi, Takushi, Fukasawa, Masanaga, Komachi, Jun, Ansai, Hisahiro
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4931782
Date:
November, 2015
File:
PDF, 3.56 MB
english, 2015
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