Robust, Uniform, and Highly Emissive Quantum Dot-Polymer...

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ACS Applied Materials & Interfaces 2017 / 04

Robust, Uniform, and Highly Emissive Quantum Dot-Polymer Films and Patterns Using Thiol-ene Chemistry

Smith, Markus, Malak, Sidney T., Jung, Jaehan, Yoon, Young Jun, Lin, Chun Hao, Kim, Sunghan, Lee, Kyung Min, Ma, Ruilong, White, Timothy J., Bunning, Timothy J., Lin, Zhiqun, Tsukruk, Vladimir V.
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Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.7b03366
Date:
April, 2017
File:
PDF, 2.16 MB
english, 2017
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