Atomic Layer Etching of Silicon Dioxide Using Alternating...

  • Main
  • 2017 / 04
  • Atomic Layer Etching of Silicon Dioxide Using Alternating...

Atomic Layer Etching of Silicon Dioxide Using Alternating C4F8 and Energetic Ar+ Plasma Beams

Kaler, Sanbir Singh, Lou, Qiaowei, Donnelly, Vincent, Economou, Demetre
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/1361-6463/aa6f40
Date:
April, 2017
File:
PDF, 827 KB
english, 2017
Conversion to is in progress
Conversion to is failed