Atomic Layer Etching of Silicon Dioxide Using Alternating C4F8 and Energetic Ar+ Plasma Beams
Kaler, Sanbir Singh, Lou, Qiaowei, Donnelly, Vincent, Economou, DemetreLanguage:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/1361-6463/aa6f40
Date:
April, 2017
File:
PDF, 827 KB
english, 2017