Molecular ion implantation in silicon
Andreas Markwitz, Horst Baumann, Rolf W. Michelmann, Jörg D. Meyer, Eberhard F. Krimmel, Klaus BethgeVolume:
125
Year:
1997
Language:
english
Pages:
4
DOI:
10.1007/bf01246204
File:
PDF, 355 KB
english, 1997