SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Emerging Patterning Technologies - The opportunity and challenge of spin coat based nanoimprint lithography
Bencher, Christopher, Cheng, Joy Y., Jung, Wooyung, Cho, Jungbin, Choi, Eunhyuk, Lim, Yonghyun, Bok, Cheolkyu, Tsuji, Masatoshi, Kobayashi, Kei, Kono, Takuya, Nakasugi, TetsuroVolume:
10144
Year:
2017
Language:
english
DOI:
10.1117/12.2257845
File:
PDF, 4.46 MB
english, 2017