![](/img/cover-not-exists.png)
Reactive Ion Etch Initiation Delay in BCl[sub 3]∕SF[sub 6]∕Ar Plasmas Due to Native Oxide Removal in NH[sub 4]OH∕H[sub 2]O
Nordheden, Karen J.Volume:
2
Year:
1999
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1390728
File:
PDF, 44 KB
english, 1999