Reactive Ion Etch Initiation Delay in BCl[sub 3]∕SF[sub...

Reactive Ion Etch Initiation Delay in BCl[sub 3]∕SF[sub 6]∕Ar Plasmas Due to Native Oxide Removal in NH[sub 4]OH∕H[sub 2]O

Nordheden, Karen J.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
2
Year:
1999
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1390728
File:
PDF, 44 KB
english, 1999
Conversion to is in progress
Conversion to is failed