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Selective epitaxial growth properties and strain characterization of Si1−xGexin SiO2trench arrays
Koo, Sangmo, Jang, Hyunchul, Ko, Dae-HongVolume:
70
Language:
english
Journal:
Journal of the Korean Physical Society
DOI:
10.3938/jkps.70.714
Date:
April, 2017
File:
PDF, 1.47 MB
english, 2017