Multiscale approach for simulation of silicon etching using...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2017 / 05 Vol. 35; Iss. 3

Multiscale approach for simulation of silicon etching using SF 6 /C 4 F 8 Bosch process

Le Dain, Guillaume, Rhallabi, Ahmed, Fernandez, Marie Claude, Boufnichel, Mohamed, Roqueta, Fabrice
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4982687
Date:
May, 2017
File:
PDF, 2.36 MB
english, 2017
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