SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Applicability of alternating phase shifting masks using polarized light
Bubke, Karsten, Flagello, Donis G., Sczyrba, Martin, Pierrat, ChristopheVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656269
File:
PDF, 319 KB
english, 2006