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Separate evaluation of multiple film-forming species in chemical vapor deposition of SiC using high aspect-ratio microchannels
Shima, Kohei, Sato, Noboru, Funato, Yuichi, Fukushima, Yasuyuki, Momose, Takeshi, Shimogaki, YukihiroVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06HE02
Date:
June, 2017
File:
PDF, 1.16 MB
english, 2017