Injection of auxiliary electrons for increasing the plasma density in highly charged and high intensity ion sources
Odorici, F., Malferrari, L., Montanari, A., Rizzoli, R., Mascali, D., Castro, G., Celona, L., Gammino, S., Neri, L.Volume:
87
Language:
english
Journal:
Review of Scientific Instruments
DOI:
10.1063/1.4933020
Date:
February, 2016
File:
PDF, 3.43 MB
english, 2016