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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Technology for defectivity improvement in resist coating and developing process in EUV lithography process
Panning, Eric M., Goldberg, Kenneth A., Kamei, Yuya, Shiozawa, Takahiro, Kawakami, Shinichiro, Shite, Hideo, Ichinomiya, Hiroshi, Enomoto, Masashi, Nafus, Kathleen, Demand, Marc, Foubert, PhilippeVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2257931
File:
PDF, 365 KB
english, 2017