SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Contribution of EUV mask CD variability on LCDU
Panning, Eric M., Goldberg, Kenneth A., Qi, Zhengqing John, Rankin, Jed, Sun, Lei, Levinson, HarryVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2258136
File:
PDF, 1.22 MB
english, 2017