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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Arc-shaped slit effect of EUV lithography with anamorphic high-NA system in terms of critical dimension variation
Panning, Eric M., Goldberg, Kenneth A., Kim, In-Seon, Kim, Guk-Jin, Yeung, Michael, Barouch, Eytan, Oh, Hye-KeunVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2258188
File:
PDF, 2.28 MB
english, 2017