SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Integrated approach to improving local CD uniformity in EUV patterning
Panning, Eric M., Goldberg, Kenneth A., Liang, Andrew, Hermans, Jan, Tran, Timothy, Viatkina, Katja, Liang, Chen-Wei, Ward, Brandon, Chuang, Steven, Yu, Jengyi, Harm, Greg, Vandereyken, Jelle, Rio, DaVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2258192
File:
PDF, 785 KB
english, 2017