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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)
Panning, Eric M., Goldberg, Kenneth A., Schafgans, Alexander A., Brown, Daniel J., Fomenkov, Igor V., Tao, Yezheng, Purvis, Michael, Rokitski, Slava I., Vaschenko, Georgiy O., Rafac, Robert J., BrandtVolume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2258628
File:
PDF, 114 KB
english, 2017