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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Extreme Ultraviolet (EUV) Lithography VIII - High-volume manufacturing compatible dry development rinse process (DDRP): patterning and defectivity performance for EUVL
Panning, Eric M., Goldberg, Kenneth A., Sayan, Safak, Vanelderen, Pieter, Hetel, Iulian, Chan, BT, Raghavan, Praveen, Blanco, Victor, Foubert, Philippe, D'urzo, Lucia, De Simone, Danilo, Vandenberghe,Volume:
10143
Year:
2017
Language:
english
DOI:
10.1117/12.2261741
File:
PDF, 1.01 MB
english, 2017