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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Study of flowability effect on self-planarization performance at SOC materials
Hohle, Christoph K., Gronheid, Roel, Yun, Huichan, Kim, Jinhyung, Park, Youjung, Kim, Yoona, Jeong, Seulgi, Baek, Jaeyeol, Yoon, Byeri, Lim, SanghakVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2257880
File:
PDF, 702 KB
english, 2017