SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - CD-SEM metrology and OPC modeling for 2D patterning in advanced technology nodes (Conference Presentation)
Sanchez, Martha I., Ukraintsev, Vladimir A., Wallow, Thomas I., Zhang, Chen, Fumar-Pici, Anita, Chen, Jun, Laenens, Bart, Spence, Christopher A., Rio, David, van Adrichem, Paul, Dillen, Harm, Wang, JiVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2260443
File:
PDF, 120 KB
english, 2017