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Role of surface-reaction layer in HBr/fluorocarbon-based plasma with nitrogen addition formed by high-aspect-ratio etching of polycrystalline silicon and SiO 2 stacks
Iwase, Taku, Matsui, Miyako, Yokogawa, Kenetsu, Arase, Takao, Mori, MasahitoVolume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.06HB02
Date:
June, 2016
File:
PDF, 997 KB
english, 2016