Experimental investigation of SF 6...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2017 / 05 Vol. 35; Iss. 3

Experimental investigation of SF 6 –O 2 plasma for advancement of the anisotropic Si etch process

Alshaltami, Khaled A., Morshed, Muhammad, Gaman, Cezar, Conway, Jim, Daniels, Stephen
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Volume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4981785
Date:
May, 2017
File:
PDF, 1.03 MB
english, 2017
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