Tunable defect engineering on TiON thin films by multi-step...

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Journal of Materials Chemistry C 2017

Tunable defect engineering on TiON thin films by multi-step sputtering processes: From Schottky diode to resistive switching memory

Su, Teng-Yu, Huang, Chi-Hsin, Shih, Yu-Chuan, Wang, Tsang-Hsuan, Medina, Henry, Huang, Jian-Shiou, Tsai, Hsu-Sheng, Chueh, Yu-Lun
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Year:
2017
Language:
english
Journal:
J. Mater. Chem. C
DOI:
10.1039/C7TC01130J
File:
PDF, 1.78 MB
english, 2017
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