Three-Dimensional Elemental Analysis of Commercial 45 nm...

Applied Physics Express 2011 / 10 Vol. 4; Iss. 11

Three-Dimensional Elemental Analysis of Commercial 45 nm Node Device with High-$k$/Metal Gate Stack by Atom Probe Tomography

Inoue, Koji, Takamizawa, Hisashi, Kitamoto, Katsuyuki, Kato, Jun, Miyagi, Takahiro, Nakagawa, Yoshitsugu, Kawasaki, Naohiko, Sugiyama, Naoyuki, Hashimoto, Hideki, Shimizu, Yasuo, Toyama, Takeshi, Naga
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Volume:
4
Language:
english
Journal:
Applied Physics Express
DOI:
10.1143/APEX.4.116601
Date:
October, 2011
File:
PDF, 2.44 MB
english, 2011
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