SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - Application of advanced hybrid metrology method to nanoimprint lithography
Sanchez, Martha I., Ukraintsev, Vladimir A., Osherov, Ilya, Issacharoff, Limor, Gedalia, Oram, Wakamoto, Koichi, Sendelbach, Matthew, Asano, MasafumiVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2266577
File:
PDF, 801 KB
english, 2017