Hole trapping in amorphous HfO 2 and Al 2 O 3 as a source...

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Hole trapping in amorphous HfO 2 and Al 2 O 3 as a source of positive charging

Strand, Jack, Dicks, Oliver A., Kaviani, Moloud, Shluger, Alexander L.
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Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2017.05.012
Date:
May, 2017
File:
PDF, 587 KB
english, 2017
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