Evaluation of resist sensitivity in extreme...

AIP Advances 2011 / 12 Vol. 1; Iss. 4

Evaluation of resist sensitivity in extreme ultraviolet/soft x-ray region for next-generation lithography

Oyama, Tomoko Gowa, Oshima, Akihiro, Washio, Masakazu, Tagawa, Seiichi
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Volume:
1
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.3665672
Date:
December, 2011
File:
PDF, 486 KB
english, 2011
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