Chemical stability of polymers under argon gas cluster ion...

Chemical stability of polymers under argon gas cluster ion beam and x-ray irradiation

Bernasik, Andrzej, Haberko, Jakub, Marzec, Mateusz M., Rysz, Jakub, Łużny, Wojciech, Budkowski, Andrzej
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Volume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4943951
Date:
May, 2016
File:
PDF, 2.00 MB
english, 2016
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