Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2016 / 11 Vol. 34; Iss. 6
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Analytic estimation of line edge roughness for large-scale uniform patterns in electron-beam lithography
Guo, Rui, Lee, Soo-Young, Choi, Jin, Kim, Seom-Beom, Park, Sung-Hoon, Shin, In-Kyun, Jeon, Chan-UkVolume:
34
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4968186
Date:
November, 2016
File:
PDF, 1.36 MB
english, 2016