One-Step Synthesis of Silicon Oxynitride Films Using a...

Plasma Chemistry and Plasma Processing 2017 / 7 Vol. 37; Iss. 4

One-Step Synthesis of Silicon Oxynitride Films Using a Steady-State and High-Flux Helicon-Wave Excited Nitrogen Plasma

Huang, Tianyuan, Jin, Chenggang, Yu, Jun, Yang, Yan, Zhuge, Lanjian, Wu, Xuemei, Sha, Zhendong
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Volume:
37
Language:
english
Journal:
Plasma Chemistry and Plasma Processing
DOI:
10.1007/s11090-017-9822-x
Date:
July, 2017
File:
PDF, 1.49 MB
english, 2017
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