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Influence of Oxygen Additions on the Etch Characteristics of TaN Thin Films in CF4/Ar Plasma
Joo, Young-Hee, Kim, Chang-IlVolume:
16
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2016.13685
Date:
December, 2016
File:
PDF, 2.64 MB
english, 2016