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Roles of chemical stoichiometry and hot electrons in realizing the stable resistive transition of sputter-deposited silicon oxide films
Yamaguchi, Rintaro, Sato, Shingo, Omura, YasuhisaVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.041301
Date:
April, 2017
File:
PDF, 1.14 MB
english, 2017