Study on re-sputtering during CN x...

Physics of Plasmas 2015 / 10 Vol. 22; Iss. 10

Study on re-sputtering during CN x film deposition through spectroscopic diagnostics of plasma

Liang, Peipei, Yang, Xu, Li, Hui, Cai, Hua, Sun, Jian, Xu, Ning, Wu, Jiada
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Volume:
22
Language:
english
Journal:
Physics of Plasmas
DOI:
10.1063/1.4932326
Date:
October, 2015
File:
PDF, 6.17 MB
english, 2015
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