SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Exploration of a low-temperature PEALD technology to trim and smooth 193i photoresist
Hohle, Christoph K., Gronheid, Roel, Lazzarino, Frederic, Paolillo, Sara, Peter, Anthony, De Roest, David, Seong, TaeGeun, Wu, Yizhi, Decoster, Stefan, Rutigliani, Vito, Lorusso, Gian Francesco, ConstVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2258040
File:
PDF, 3.63 MB
english, 2017