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Effect of deposition parameters on properties of TiO 2 films deposited by reactive magnetron sputtering
Wang, Bo, Wei, Shicheng, Guo, Lei, Wang, Yujiang, Liang, Yi, Xu, Binshi, Pan, Fusheng, Tang, Aitao, Chen, XianhuaLanguage:
english
Journal:
Ceramics International
DOI:
10.1016/j.ceramint.2017.05.139
Date:
May, 2017
File:
PDF, 2.09 MB
english, 2017