In-Situ IR-Spectroscopy as Tool for Monitoring the Radical...

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Nanoscale 2017

In-Situ IR-Spectroscopy as Tool for Monitoring the Radical Hydrosilylation Process on Silicon Nanocrystal Surfaces

Kehrle, Julian, Kaiser, Simon, Purkait, Tapas K., Winnacker, Malte, Helbich, Tobias, Vagin, Sergei Igorevich, Veinot, Jonathan, Rieger, Bernhard
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Year:
2017
Language:
english
Journal:
Nanoscale
DOI:
10.1039/C7NR02265D
File:
PDF, 752 KB
english, 2017
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