SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Modeling of NTD resist shrinkage
Hohle, Christoph K., Gronheid, Roel, Mülders, Thomas, Stock, Hans-Jürgen, Küchler, Bernd, Klostermann, Ulrich, Gao, Weimin, Demmerle, WolfgangVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2257909
File:
PDF, 1.00 MB
english, 2017