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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advanced Etch Technology for Nanopatterning VI - Design and fabrication of resonator-QWIP for SF 6 gas sensor application
Engelmann, Sebastian U., Wise, Rich S., Sun, J., Choi, K. K., DeCuir, E. A., Olver, K. A., Fu, R. X.Volume:
10149
Year:
2017
Language:
english
DOI:
10.1117/12.2257990
File:
PDF, 5.48 MB
english, 2017