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Change in Slurry/Glass Interfacial Resistance by Chemical Mechanical Polishing
Sugimoto, Taku, Suda, Seiichi, Kawahara, KoichiLanguage:
english
Journal:
MRS Advances
DOI:
10.1557/adv.2017.335
Date:
May, 2017
File:
PDF, 632 KB
english, 2017