Improving the degree of crystallinity of...

Thin Solid Films 2017 / 5

Improving the degree of crystallinity of magnetron-sputtered Ta 3 N 5 thin films by augmenting the ion flux onto the substrate

Rudolph, M., Demeter, A., Foy, E., Tiron, V., Sirghi, L., Minea, T., Bouchet-Fabre, B., Hugon, M.-C.
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Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2017.05.033
Date:
May, 2017
File:
PDF, 1.97 MB
english, 2017
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