Reaction Mechanisms of the Atomic Layer Deposition of Tin...

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Langmuir 2017 / 05

Reaction Mechanisms of the Atomic Layer Deposition of Tin Oxide Thin Films Using Tributyltin Ethoxide and Ozone

Nanayakkara, Charith E, Liu, Guo, Vega, Abraham, Dezelah, Charles L., Kanjolia, Ravindra K., Chabal, Yves J.
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Language:
english
Journal:
Langmuir
DOI:
10.1021/acs.langmuir.7b00716
Date:
May, 2017
File:
PDF, 1.14 MB
english, 2017
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