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Effective–CD: a contribution toward the consideration of line edge roughness in the scatterometric critical dimension metrology
Bilski, Bartosz, Frenner, Karsten, Osten, WolfgangVolume:
16
Language:
english
Journal:
Journal of Micro/Nanolithography, MEMS, and MOEMS
DOI:
10.1117/1.JMM.16.2.024002
Date:
May, 2017
File:
PDF, 2.76 MB
english, 2017