Reliability of Post Plasma Oxidation Processed ALD Al...

ECS Transactions 2017 / 04 Vol. 77; Iss. 2

Reliability of Post Plasma Oxidation Processed ALD Al 2 O 3 /Hf 1-x Zr x O 2 Thin Films on Ge Substrates

Bhuyian, Md Nasir Uddin, Sengupta, Arijit, Ding, Yiming, Misra, Durga, Tapily, Kandabara, Clark, Robert D., Consiglio, Steven, Wajda, Cory S., Leusink, Gert J.
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Volume:
77
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/07702.0099ecst
Date:
April, 2017
File:
PDF, 877 KB
english, 2017
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