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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Factors analysis on the physical properties of the low-temperature SOC of memory cell characteristics
Hohle, Christoph K., Gronheid, Roel, Kwak, Doyoung, Kim, Jaeyeol, Park, Jihoon, Park, Jeonqsu, Lee, Sungkoo, Kim, Seomin, Jung, Taewoo, Kim, HyeongsooVolume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2257983
File:
PDF, 491 KB
english, 2017