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Understanding ferroelectric Al:HfO 2 thin films with Si-based electrodes for 3D applications
Florent, K., Lavizzari, S., Popovici, M., Di Piazza, L., Celano, U., Groeseneken, G., Van Houdt, J.Volume:
121
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4984068
Date:
May, 2017
File:
PDF, 3.21 MB
english, 2017