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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Metrology, Inspection, and Process Control for Microlithography XXXI - SEM image prediction based on modeling of electron-solid interaction
Sanchez, Martha I., Ukraintsev, Vladimir A., Kameda, Toshimasa, Takada, Satoshi, Suzuki, Makoto, Yokosuka, Toshiyuki, Borisov, Sergey, Babin, SergeyVolume:
10145
Year:
2017
Language:
english
DOI:
10.1117/12.2257661
File:
PDF, 897 KB
english, 2017