![](/img/cover-not-exists.png)
Angled etching of Si by ClF 3 –Ar gas cluster injection
Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, JiroVolume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06HB02
Date:
June, 2017
File:
PDF, 1.17 MB
english, 2017