Angled etching of Si by ClF 3...

Japanese Journal of Applied Physics 2017 / 06 Vol. 56; Iss. 6S2

Angled etching of Si by ClF 3 –Ar gas cluster injection

Seki, Toshio, Yamamoto, Hiroki, Kozawa, Takahiro, Shojo, Tadashi, Koike, Kunihiko, Aoki, Takaaki, Matsuo, Jiro
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
56
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.56.06HB02
Date:
June, 2017
File:
PDF, 1.17 MB
english, 2017
Conversion to is in progress
Conversion to is failed