Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2017 / 07 Vol. 35; Iss. 4
Impact of ultrathin Al 2 O 3 interlayers on resistive switching in TiO x thin films deposited by atomic layer deposition
Liu, Weixia, Gao, Leiwen, Xu, Kewei, Ma, FeiVolume:
35
Language:
english
Journal:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
DOI:
10.1116/1.4985053
Date:
July, 2017
File:
PDF, 1.92 MB
english, 2017