Uniform Surface Oxidation of an Si Substrate by a Planar...

Plasma Chemistry and Plasma Processing 2017 / 5 Vol. 37; Iss. 3

Uniform Surface Oxidation of an Si Substrate by a Planar Modulated Inductively Coupled Thermal Plasma with Molecular Gas Feed

Tial, Mai Kai Suan, Tanaka, Yasunori, Maruyama, Yuji, Tsuchiya, Takumi, Uesugi, Yoshihiko, Ishijima, Tatsuo
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Volume:
37
Language:
english
Journal:
Plasma Chemistry and Plasma Processing
DOI:
10.1007/s11090-017-9803-0
Date:
May, 2017
File:
PDF, 4.15 MB
english, 2017
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