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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 26 February 2017)] Advances in Patterning Materials and Processes XXXIV - Free energy of defects in chemoepitaxial block copolymer directed self-assembly: effect of pattern density and defect position
Hohle, Christoph K., Gronheid, Roel, Nation, Benjamin D., Breaux, Caleb L., Ludovice, Peter J., Henderson, Clifford L.Volume:
10146
Year:
2017
Language:
english
DOI:
10.1117/12.2276197
File:
PDF, 817 KB
english, 2017